The main purpose of this workshop is to provide the basics and applications of focused electron and ion beam lithography for scientific researchers. Focused electron and ion beam lithography has been extensively pushing cutting-edge research such as nano-electronics, nano-photonics, nano-magnetism, quantum physics, material sciences, nanotechnology, etc., to higher and higher levels. We first introduce basic theory of scanning electron microscopy (SEM), electron beam lithography (EBL), and focused ion beam lithography (FIB). Related lithography methods include electron-beam direct writing, electron-beam induced deposition, ion-beam induced deposition and ion-beam milling. Advanced techniques in both electron and ion beam lithography will be also discussed, such as ultrafine alignment and proximity correction in Raith e-beam system. We then present various applications of electron and ion beam lithography in R&D such as nanowire and nanotube devices, quantum nanoresonators, superconducting qubit devices, quantum photonics and plasmonics devices, T-gates, etc.