摘要详情

ID / 提交时间

20 / 2024-03-27 17:21:35

标题

3D Pic-Mcc simulation of post-arc particles expansion for curved contact under different metal vapour density

关键字

vacuum arc,post-arc,pic-mcc

主题及专题

7)Fundamental physics in Switchgear

状态

摘要录用

作者

Tong Ziang / University of Science and Technology Beijing

Xiwei Jiang / Inner Mongolia Power (Group) Co., Ltd.

Xiaosong Shen / Shandong Taikai High Voltage Switchgear CO.，LTD.

Zhiliang Guo / Opu Tiancheng (Xiamen) Optoelectronics Co., Ltd.

Yuan Jiang / University of Science and Technology Beijing

Shengxiu Wu / Guizhou Tianyi Electrical Co., Ltd

Jingyi Lin / Beihang University (Beijing University of Aeronautics and Astronautics)

Dejie Wei / Beihang University (Beijing University of Aeronautics and Astronautics)

Shangwen Xia / Beihang University (Beijing University of Aeronautics and Astronautics)

Jianwen Wu / Beihang University

摘要

Curved contact is a vacuum interrupter contact structure with excellent interrupting performance. The process of post arc dielectric recovery during the disconnection process is not yet clear. However, one-dimensional and two-dimensional Particle-In-Cell/Monte Carlo (Pic-Mcc) models cannot accurately describe this process. This article establishes a three-dimensional Pic-Mcc model for the dielectric recovery process after vacuum arc of curved contacts. Under different metal vapour density, the particle diffusion process and particle characteristics of curved contact in the post-arc phase were compared and analyzed.