Study on the Breakdown Characteristics of Metallized Film under AC/DC Superimposed Voltage
编号:87 访问权限:仅限参会人 更新:2022-08-29 11:04:51 浏览:135次 口头报告

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摘要
Purpose/Aim
Owing to the advantage of high reliability, metallized film capacitors are widely used in DC-link applications withstanding DC/AC superimposed voltage. Therefore, it is necessary to study the breakdown characteristics of metallized films under DC/AC superimposed voltage to evaluate the insulating properties of capacitors accurately.
Experimental/Modeling methods
Two overlapping metallized films are used to be the test sample. The DC/AC superimposed voltage with increasing amplitude is applied on the film until the film breaks down. An oscilloscope is used to record the voltage and current waveforms.
Results/discussion
The breakdown field strength of the metallized film hardly changes with k when the AC/DC voltage ratio k < 1, but decreases significantly with the increase of k when k > 1.The breakdown mainly occurs on the rising edge before the peak of AC voltage and keeps approaching the peak as k increases.
Conclusions
The main factor that causes the breakdown of the metallized film is the voltage peak rather than the voltage change rate. When the AC/DC voltage ratio is less than 1, the DC voltage can be used to evaluate the operating performance of the capacitor based on the peak equivalent principle.
关键词
Metallized film; DC-link capacitor; DC-AC composite voltage; breakdown
报告人
Guohao Zhang
Huazhong University of Science and Technology

稿件作者
Guohao Zhang Huazhong University of Science and Technology
Hua Li Huazhong University of Science and Technology
Haobo Li Huazhong University of Science and Technology
Fuchang Lin Huazhong University of Science and Technology
Qin Zhang Huazhong University of Science and Technology
Yan Wang Huazhong University of Science and Technology
Xingang Yang State Grid Shanghai Municupal Electric Power Company
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重要日期
  • 会议日期

    09月25日

    2022

    09月29日

    2022

  • 08月15日 2022

    提前注册日期

  • 09月10日 2022

    报告提交截止日期

  • 11月10日 2022

    注册截止日期

  • 11月30日 2022

    初稿截稿日期

  • 11月30日 2022

    终稿截稿日期

主办单位
IEEE DEIS
承办单位
Chongqing University
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