372 / 2018-03-29 22:55:34
Reliability investigation of AlGaN/GaN HEMTs under reverse-bias stress at 77K
low temperature; trap; reverse-bias step stress; ALGaN/GaN; HEMT; reliability
摘要待审
Qing Zhu / Xidian University
The degradation phenomenon and mechanism of AlGaN/GaN HEMTs working at cryogenic temperature have been rarely reported. In this paper, degradation of AlGaN/GaN HEMTs under reverse-bias step stress at 300K and 77K was investigated. The electrons tunneling from gate electrode trapped at the SiN/AlGaN interface and in the AlGaN barrier were more difficult to escape at 77K compared with 300K. The trapping and detrapping behavior had a more serious affect on the properties of devices after reverse bias stress at low temperature than at room temperature. The trapped electrons reduced the electric field peak on the gate edge and few thermal phonons existed at the lower temperature resulting in the higher “critical voltage” for inverse piezoelectric effect at 77K.
重要日期
  • 会议日期

    05月17日

    2018

    05月19日

    2018

  • 12月08日 2017

    摘要截稿日期

  • 01月30日 2018

    摘要录用通知日期

  • 02月10日 2018

    初稿截稿日期

  • 02月10日 2018

    终稿截稿日期

  • 05月19日 2018

    注册截止日期

主办单位
IEEE
IEEE ELECTRONIC DEVICE SOCIETY
IEEE POWER ELECTRONIC SOCIETY
中国电源学会
中国半导体产业创新联盟
承办单位
西安交通大学
西安电子科技大学
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